Workshops

Electron Microscopy – Biological Science
Electron Microscopy – Materials Science
Light Microscopy


Electron Microscopy – Biological Science

Sorry. This workshop is full.
W1: Cryo-Electron Microscopy and 3D Image Processing of Macromolecular Complexes
May 8-9, 2017 | 9:00 - 16:00
Maximum: 20 participants - SOLD OUT
Facility for Electron Microscopy Research, McGill University, Strathcona Anatomy & Dentistry Building, 3640 University Street
Organized by: Javier Vargas

The field of cryo-EM is living the so-called resolution revolution thanks to a series of technical advantages, and is starting to provide high-resolution reconstructions routinely. However, at present, cryo-EM is not a push-button technique and a lot of experience has to be added to the reconstruction process. In this workshop participants will be exposed to computational methods from most of the best known software packages (Relion, Eman, Xmipp, etc), using the integrating platform Scipion.


W2: Microscopy Image Processing Basics with ImageJ/Fiji
May 8, 2017 | 9:00 - 16:00
Maximum: 25 participants
M-635, Pavillon Roger-Gaudry, Université de Montréal
Organized by: Monique Vasseur and Aurélien Fouillen

Note: As a complimentary course, we recommend that you also take W9 Workshop entitled "Basics of Image Processing and Analysis with FIJI" scheduled on May 12.

Image Processing for Nulls. This workshop is an introduction to microscopy digital image characteristics (values, pixel size, binning, dynamic range, color or monochrome type, metadata) and to basic light and EM microscopy image processing with ImageJ/Fiji (conversion, file formats, basic tools for visual enhancement, background corrections, filters, calibration, basic measurements, particle analysis). Theory will be introduced via different exercises using ImageJ tools. ImageJ/Fiji is an open source image processing program designed for scientific multidimensional images. http://imagej.net/Welcome


W4: Preparation and Imaging of Frozen Samples from High Pressure Freezing to Cryo-SEM
May 9, 2017 | 9:00 - 16:00
Maximum: 10 participants
Facility for Electron Microscopy Research, McGill University, Strathcona Anatomy & Dentistry Building, 3640 University Street
Organized by: Stephen Wood and S Kelly Sears
Sponsored by: Edge Scientific and Leica Microsystems

Kin Rensing, Applications Specialist, Edge Scientific, will direct the workshop along with staff from the Facility for Electron Microscopy Research. The workshop will provide participants with an overview of the workflow for sample preparation for imaging in cryoSEM. The workflow instruments will include the Leica EM ICE High Pressure Freezer, EM UC7/FC7 Cryoultramicrotome, EM VCT100 Cryo-Transfer System, and FEI Helios Nanolab 660 DualBeam.


Sorry. This workshop is full.
W13: Cryo-TEM
May 12, 2017 | 9:00 - 16:00
Maximum: 10 participants - SOLD OUT
Facility for Electron Microscopy Research, McGill University, Strathcona Anatomy & Dentistry Building, 3640 University Street
Organized by: Jeff Pageau and S Kelly Sears
Sponsored by: Systems for Research and FEI Company

Cedric Bouchet-Marquis, Senior TEM Applications Engineer at FEI, will direct the workshop along with staff from the Facility for Electron Microscopy Research. Cryo-electron microscopy is developing at a rapid pace. Laboratories around the world are being equipped with high-end TEMs, like the FEI Titan Krios, enabling what was once a niche application only a couple of years ago to become the method of choice for researchers to investigate cellular events in 2-D/3-D and molecular structures in-vitro at high-resolution as well as their function in the cell. To make cryo-TEM a reliable and a high-throughput technique for users, FEI has developed a complete workflow. This includes sample preparation using the Vitrobot™ Mark IV automated vitrification device, mounting and storing samples free of contaminants into the autoloader as well as a suite of software dedicated to automated electron tomography or single particle acquisition. The complete workflow will be demonstrated in this workshop.



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Electron Microscopy – Materials Science


W3: Materials Characterization Using Modern SEM
May 9, 2017 | 9:00 - 16:00
Maximum: 10 participants
McGill University, Wong Building, 3610 University Street, Montreal QC H3A 0C5
Organized by: Hendrix Demers, Nicolas Brodusch and Patrick Woo

The new generation of field-emission scanning electron microscopes allows the characterization of nanomaterials. This workshop describes materials characterization using modern SEM using EDS, EBSD and high resolution imaging at low accelerating voltage as well as in SEM/STEM mode. The fundamental aspects as well as practical aspects using electron beam techniques will be covered. This workshop should provide a solid foundation for nanomaterial characterization for the beginning to intermediate investigator.


W6: Advances in 3D Imaging Methods
May 12, 2017 | 9:00 - 12:00
Maximum: 50 participants
McGill University, Room 1/12, Strathcona Anatomy and Dentistry Building,
3640 University Street, Montreal QC H3A 0C7
Organized by: Canadian Centre for Electron Microscopy Users Group

The Canadian Centre for Electron Microscopy is happy to offer a half-day workshop presenting some of the latest techniques for 3D imaging of materials and devices. Invited speakers including Keana Scott (NIST) and Jan Ringnalda (FEI), and experts from the Centre will present recent advances in methods such as electron tomography, focused ion beam serial sectioning, and atom probe tomography. Data reconstruction is a key component of the 3D imaging process and the latest methods and software will also be discussed.


Sorry. This workshop is cancelled.
W10: Half-day on FIB and Half-day on TEM/EDX
May 12, 2017 | 09:00-12:00 or 13:30-16:30*
*(Please note that the morning session must be filled before the afternoon session becomes available)
Maximum: 10 participants
École Polytechnique de Montréal, Room A-481, 4th floor of the main building of Polytechnique, 2500 Chemin de Polytechnique [ link to map »]
Organized by: Gilles L'Espérance

Half day workshop on FIB sample preparation and another half day workshop on TEM-EDS. The workshop will be constituted as demos for the various techniques preceded by a review on theory befind FIB and TEM-EDX techniques.


W11: Advancements in XRay Microscopy and 3D Reconstruction Techniques
May 9, 2017 | 9:00 - 16:00
Maximum: 8 participants
McGill, Bellini Life Science Complex, Room 132, 3649 Sir William Osler
Organized by: Jackie Vogel & Stephen Wood
Sponsored by: Carl Zeiss Canada and ORS

Note: Participants should have submitted a sample for imaging ahead of the workshop (submission deadline to be determined).

Join us for a for a full day workshop consisting of a presentation on advancements in XRay Microscopy as well as 3D Reconstruction and Segmentation from ORS. Participants are encouraged to send a sample in advance for imaging on the Zeiss XRadia Versa 520. hands on activities include sample scanning methods, and real time 3D Reconstruction and Segmentation. Priority will be given to participants who have submitted a sample for analysis.


W12: Two- and Three-Dimensional Characterization of Soft and Porous Materials using DualBeam FIB-SEM
May 12, 2017 | 9:00 - 16:00
Maximum: 10 participants
Facility for Electron Microscopy Research, McGill University, Strathcona Anatomy & Dentistry Building, 3640 University Street
Organized by: Jeff Pageau and S Kelly Sears
Sponsored by: Systems for Research and FEI Company

Brandon Van Leer, Business Development & Product Marketing Engineer at FEI, will direct the workshop along with staff from the Facility for Electron Microscopy Research. Focused ion beam (FIB) microscopy uses either a Ga+ or Xe+ ions to remove material from a sample for a variety of imaging and preparation techniques including cross-sections and thin sections for S/TEM analysis. Considerable work has examined the effects of FIB for sputtering and exposure on a number of hard materials such as metals or semiconductors. Often methods used to sputter hard materials do not necessarily translate well when working with soft materials such as polymers, porous materials or other beam sensitive materials. In this workshop, we will work with soft materials in the DualBeam FIB-SEM to optimize the sputter conditions to achieve optimal results for 2-D and 3-D characterization. Particularly, we will emphasize beam conditions for successful sputtering of soft materials, the use of cryo-stages for cryo-DualBeam and investigate how to best optimize electron beam imaging conditions to mitigate charge or achieve the highest resolution.


W14: Electron Beam Lithography
May 9, 2017 | 13:00 - 16:00
Maximum: 5 participants
McGill university, M. H. Wong Building RM0381, 3610 University Street
Organized by: Stefano Rubino and John Li
Sponsored by: Soquelec and TESCAN

Electron beam lithography (EBL) is a form of maskless lithography that uses the electron beam to direct write a pattern on a resist, which is subsequently selectively removed. This is a widely used method in semiconductor applications for circuit printing due to its flexibility and high pattern resolution (10 nm or better). Although dedicated systems exist, an SEM equipped with a beam blanker is also capable of EBL. In this workshop we present the principles of EBL, followed by a live demonstration on the TESCAN Mira 3 XMH at the McGill Microfabrication facility. TESCAN experts will provide examples for various applications and techniques. Attendance is limited due to the size of the instrument room.


Sorry. This workshop is cancelled.
W15: EELS-EFTEM Data Analysis
May 9, 2017 | 13:00 - 16:00
Maximum: 25 participants
McGill university (Room TBD)
Organized by: Stefano Rubino and Paul Miller
Sponsored by: Soquelec and Gatan

In this workshop we present the latest developments on the GMS software for analysing EELS and EFTEM datasets. A brief overview of the theory and method will be followed by in-depth evaluation of example datasets. Depending on attendance number, there is the possibility of a hands-on session. Furthermore, participants have the option to bring their own dataset to be analysed (please contact directly Stefano Rubino in such a case to make arrangements).



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Light Microscopy

W2: Microscopy Image Processing Basics with ImageJ/Fiji
May 8, 2017 | 9:00 - 16:00
Maximum: 25 participants
M-635, Pavillon Roger-Gaudry, Université de Montréal
Organized by: Monique Vasseur and Aurélien Fouillen

Note: As a complimentary course, we recommend that you also take W9 Workshop entitled "Basics of Image Processing and Analysis with FIJI" scheduled on May 12.

Image Processing for Nulls. This workshop is an introduction to microscopy digital image characteristics (values, pixel size, binning, dynamic range, color or monochrome type, metadata) and to basic light and EM microscopy image processing with ImageJ/Fiji (conversion, file formats, basic tools for visual enhancement, background corrections, filters, calibration, basic measurements, particle analysis). Theory will be introduced via different exercises using ImageJ tools. ImageJ/Fiji is an open source image processing program designed for scientific multidimensional images. http://imagej.net/Welcome


W5: High Content Imaging and Analysis
May 12, 2017 | 13:00-16:00
Maximum: 8 participants
McGill, McIntyre Bldg., 13th floor. Room 1349, 3655 Prom. Sir William Osler
Organized by: Wolfgang Reintsch

Automated image acquisition in multiwell-formats and subsequent automated image analysis allows to extract multiple parameters from images and analyze many experimental conditions in a fast and unbiased manner. This technique is widely used for many different types of cellular assays, for example cell proliferation, differentiation, toxicity, cell migration or phenotypic analysis. We will give an introduction to both image acquisition and image analysis, using the Operetta/Columbus (PerkinElmer) High Content System.


W7: Introduction to Super Resolution Microscopy
May 12, 2017 | 9:00 - 16:00
Maximum: 12 participants
Montreal Neurological Institute
Organized by: Thomas Stroh
Sponsored by: Abberior Instruments and Nikon

The workshop will consist of a half day of seminars and a half day hands-on imaging at STED, SIM and STORM microscopes. It will focus on optimal vs. erroneous sample preparation for super-resolution microscopy. We will discuss why certain fluorophores do or do not work well in STED or STORM and explain what the photo-chemical background to this differential behavior is. We will also discuss other aspects of sample preparation such as mounting media, cover glasses, etc. and learn how they relate to super-resolution microscopy.


W8-a and b: Basics in Confocal Microscopy
May 12, 2017 | 2 groups : (a) 9:00 - 12:00 and (b) 13:00 to 16:00
Maximum: 4 participants
CRCHUM
Organized by: Aurélie Cleret-Buhot

Note: Pre-requirement – Participants must have some knowledge of basics in fluorescence microscopy.

Learn the basics to do high quality images with a laser point-scanning confocal microscope.
Instrument to be used: Leica SP5.
Stacks and spectral detection can also be discussed.


W9: Basics of Image Processing and Analysis with FIJI
May 12, 2017 | 9:30 - 16:30
Maximum: 12 participants
Concordia SP Building, Loyola Campus
Organized by: Chris Law

Note: As a complimentary course, we recommend that you also take the W2 Workshop entitled "Light Microscopy Image Processing Basics with ImageJ/Fiji" scheduled on May 8.

The aim of this workshop is to provide users with an introduction to image analysis using FJI; what makes up an image, how to perform basic manipulations, and an introduction to the macro language. A lecture will introduce the basic concepts, followed by several hours of group/individual work, where participants will work with the ImageJ macro code to analyse example images and their own images (time permitting). Everyone should leave with the confidence and knowledge to play with the ImageJ macro language sufficiently to produce their own image processing and analysis macros.


 


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